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Evaluation of Double Process Lithography (DPL) with bi-layer photo-resist process for contact layer-patterning

Author(s):
  • G. Chen ( Freescale Semiconductor, Inc., United States )
  • K. Wu ( Freescale Semiconductor, Inc., United States )
Publication title:
Photomask technology 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7122
Pub. Year:
2008
Vol.:
1
Page(from):
71220O-1
Page(to):
71220O-7
Pages:
7
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473554 [0819473553]
Language:
English
Call no.:
P63600/7122
Type:
Conference Proceedings

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