Accuracy considerations for critical dimension semiconductor metrology
- Author(s):
- N. G. Orji ( National Institute of Standards and Technology, United States )
- R. G. Dixson ( National Institute of Standards and Technology, United States )
- B. D. Bunday ( International SEMATECH Manufacturing Initiative, United States )
- J. A. Allgair ( International SEMATECH Manufacturing Initiative, United States )
- Publication title:
- Instrumentation, metrology, and standards for nanomanufacturing II : 10 August 2008, San Diego, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 7042
- Pub. Year:
- 2008
- Page(from):
- 70420A-1
- Page(to):
- 70420A-11
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819472625 [081947262X]
- Language:
- English
- Call no.:
- P63600/7042
- Type:
- Conference Proceedings
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