Modeling mask pellicle effects for OPC/RET

Modeling mask pellicle effects for OPC/RET

Author(s):

L. Zavyalova ( Synopsys Inc., USA )
H. Song ( Synopsys Inc., USA )
K. Lucas ( Synopsys Inc., USA )
Q. Zhang ( Synopsys Inc., USA )
J. Shiely ( Synopsys Inc., USA )

Publication title:

Photomask and next-generation lithography mask technology XV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

7028

Pub. Year:

2008

Vol.:

2

Page(from):

70283B-1

Page(to):

70283B-12

Pages:

12

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819472434 [0819472433]

Language:

English

Call no.:

P63600/7028

Type:

Conference Proceedings

Details

TDL ID:	ZA00052659
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next-Generation Lithography Mask Technology
Conf. info. (Number):	2008 : 15th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2008.04.16-2008.04.18
Note for article:	Photomask and next-generation lithography mask technology XV, 16-18 April 2008, Yokohama, Japan - Poster Session 5i: RET and OPC, 70283B, 7028-115

Similar Items:

1 Conference Proceedings Modeling polarized illumination for OPC/RET H. Song, Q. Zhang, J. Shiely Society of Photo-optical Instrumentation Engineers	7 Conference Proceedings Verifying RET mask layouts Mayhew, J.P., Rieger, M.L., Li, J.W., Zhang, L., Tang, Z.W., Shiely, J.P. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Rigorous vectorial modeling for polarized illumination and projection pupil in OPC Q. Zhang, H. Song, K. Lucas, B. Ward, J. Shiely Society of Photo-optical Instrumentation Engineers	8 Conference Proceedings Efficient modeling of immersion lithography in an aggressive RET mask synthesis flow [5853-68] Bai, M., Lei, J., Zhang, L., Shiely, J. P. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Modeling of focus blur in the context of optical proximity correction Q. Zhang, H. Song, K. Lucas, J. Shiely Society of Photo-optical Instrumentation Engineers	9 Conference Proceedings Modeling scanner signatures in the context of OPC Q. Zhang, J. K. Tyminski, K. Lucas Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Analysis of OPC optical model accuracy with detailed scanner information L. Zavyalova, K. Lucas, Q. Zhang, Y. Fan, S. Sethi Society of Photo-optical Instrumentation Engineers	10 Conference Proceedings Assist features for modeling three-dimensional mask effects in optical proximity correction Q. Yan, Z. Deng, J. Shiely, L. Melvin SPIE - The International Society of Optical Engineering
5 Conference Proceedings Polarization aberration modeling via Jones matrix in the context of OPC Q. Zhang, H. Song, K. Lucas Society of Photo-optical Instrumentation Engineers	11 Conference Proceedings Scanner-characteristics-aware OPC modeling and correction J. K. Tyminski, Q. Zhang, K. Lucas, L. Depre, P. VanAdrichem SPIE - The International Society of Optical Engineering
6 Conference Proceedings Considering mask pellicle effect for more accurate OPC model at 45nm technology node C.-H. Wang, Q. Liu, L. Zhang Society of Photo-optical Instrumentation Engineers	12 Conference Proceedings Hybrid resist model to enhance continuous process window model for OPC Q. Zhang, K. Lucas Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12