Evaluation of hotspot analysis flow using mask model
- Author(s):
- S. Kawashima ( Dai Nippon Printing Co., Ltd., Japan )
- K. Hayano ( Dai Nippon Printing Co., Ltd., Japan )
- N. Kuwahara ( Dai Nippon Printing Co., Ltd., Japan )
- S. Narukawa ( Dai Nippon Printing Co., Ltd., Japan )
- Y. Morikawa ( Dai Nippon Printing Co., Ltd., Japan )
- Publication title:
- Photomask and next-generation lithography mask technology XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 7028
- Pub. Year:
- 2008
- Vol.:
- 2
- Page(from):
- 702838-1
- Page(to):
- 702838-8
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819472434 [0819472433]
- Language:
- English
- Call no.:
- P63600/7028
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Mask pattern quality assurance based on lithography simulation with fine pixel SEM image [5992-59]
SPIE - The International Society of Optical Engineering |
2
Conference Proceedings
Evaluation of lithography simulation model accuracy for hotspot-based mask quality assurance
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Fine pixel SEM image for mask pattern quality assurance based on lithography simulation [6283-48]
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Imaging quality analysis using direct Monte Carlo simulation and CAR reaction model in mask fabrication
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
New double exposure technique using alternating phase-shifting mask with reversed phase
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Proposal of a composite phase-shifting mask for 0.15-ヲフm hole-pattern delineation using KrF exposure
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Lens aberration measurement technique using attentuated phase-shifting mask
SPIE - The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |