The verification of printability about marginal defects and the detectability at the inspection tool in sub 50nm node

The verification of printability about marginal defects and the detectability at the inspection tool in sub 50nm node

Author(s):

H. Lee ( Hynix Semiconductor Inc., South Korea )
G. Jeong ( Hynix Semiconductor Inc., South Korea )
K. Seo ( Hynix Semiconductor Inc., South Korea )
S. Kim ( Hynix Semiconductor Inc., South Korea )
C. Kim ( Hynix Semiconductor Inc., South Korea )

Publication title:

Photomask and next-generation lithography mask technology XV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

7028

Pub. Year:

2008

Vol.:

2

Page(from):

70282V-1

Page(to):

70282V-8

Pages:

8

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819472434 [0819472433]

Language:

English

Call no.:

P63600/7028

Type:

Conference Proceedings

Details

TDL ID:	ZA00052659
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next-Generation Lithography Mask Technology
Conf. info. (Number):	2008 : 15th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2008.04.16-2008.04.18
Note for article:	Photomask and next-generation lithography mask technology XV, 16-18 April 2008, Yokohama, Japan - Poster Session 5f: Metrology for Photomask, 70282V, 7028-98

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