Improvement of position accuracy in mask-writing electron beam lithography with a multi-pass writing strategy for reducing position errors due to resist charging
- Author(s):
- N. Kobayashi ( JEOL Ltd., Japan )
- K. Goto ( JEOL Ltd., Japan )
- T. Wakatsuki ( JEOL Ltd., Japan )
- T. Komagata ( JEOL USA, Inc., USA )
- Y. Nakagawa ( JEOL Ltd., Japan )
- Publication title:
- Photomask and next-generation lithography mask technology XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 7028
- Pub. Year:
- 2008
- Vol.:
- 2
- Page(from):
- 70281Y-1
- Page(to):
- 70281Y-9
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819472434 [0819472433]
- Language:
- English
- Call no.:
- P63600/7028
- Type:
- Conference Proceedings
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