Blank Cover Image

Mask CD compensation method using diffraction intensity for lithography equivalent metrology

Author(s):
  • T. Nagai ( Dai Nippon Printing Co., Ltd., Japan )
  • T. Sutou ( Dai Nippon Printing Co., Ltd., Japan )
  • Y. Inazuki ( Dai Nippon Printing Co., Ltd., Japan )
  • H. Hashimoto ( Dai Nippon Printing Co., Ltd., Japan )
  • N. Toyama ( DNP Corp. USA, USA )
Publication title:
Photomask and next-generation lithography mask technology XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7028
Pub. Year:
2008
Vol.:
1
Page(from):
70281M-1
Page(to):
70281M-10
Pages:
10
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819472434 [0819472433]
Language:
English
Call no.:
P63600/7028
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Mask CD measurement approach by diffraction intensity for lithography equivalent

T. Nagai, K. Mesudo, T. Sutou, Y. lnazuki, H. Hashimoto

Society of Photo-optical Instrumentation Engineers
7 Conference Proceedings Characteristics optimization of mask materials for hyper-NA lithography

Y. Morikawa, T. Suto, T. Nagai, Y. Inazuki, T. Adachi, Y. Kitahata, T. Yokoyama, N. Toyama, H. Mohri, N. Hayashi

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Extendibility of single mask exposure for practical ArF immersion lithography

T. Adachi, Y. Inazuki, T. Sutou, T. Nagai, N. Toyama, Y. Morikawa, H. Mohri, N. Hayashi

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Approach to analyze decomposition impact for photomask fabrication

N. Toyama, T. Adachi, Y. Inazuki, T. Sutou, T. Nagai, Y. Morikawa, H. Mohri, N. Hayashi

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Analysis of diffraction orders including mask topography effects for OPC optimization

Y. Inazuki, N. Toyama, T. Adachi, T. Nagai, T. Suto, Y. Morikawa, H. Mohri, N. Hayashi

SPIE - The International Society of Optical Engineering
9 Conference Proceedings 45-32-nm node photomask technology with water immersion lithography [6349-134]

Adachi, T., Inazuki, Y., Sutou, T., Morikawa, Y., Toyama, N., Mohri, H., Hayashi, N.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings DPL performance analysis strategy with conventional workflow

N. Toyama, Y. Inazuki, T. Sutou, T. Nagai, Y. Morikawa

Society of Photo-optical Instrumentation Engineers
10 Conference Proceedings Pupil plane analysis on AIMS 45-193i for advanced photomasks

Y. Morikawa, T. Sutou, K. Mesuda, T. Nagai, Y. Inazuki, T. Adachi, N. Toyama, H. Mohri, N. Hayashi, U. Stroessner, R. …

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Estimating DPL photomask fabrication load compared with single exposure

N. Toyama, Y. Inazuki, T. Sutou, T. Nagai, Y. Morikawa

Society of Photo-optical Instrumentation Engineers
11 Conference Proceedings Lithographic performance comparison with various RET for 45-nm node with hyper NA [6283-67]

Adachi,T., Inazuki, Y., Sutou, T., Kitahata, T., Morikawa, Y., Toyama, N., Mohri, H., Hayashi, N.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Decomposition difficulty analysis for double patterning and the impact on photomask manufacturability

Y. Inazuki, N. Toyama, T. Nagai, T. Sutou, Y. Morikawa

Society of Photo-optical Instrumentation Engineers
12 Conference Proceedings Pattern decomposition for double patterning from photomask viewpoint

N. Toyama, T. Adachi, Y. Inazuki, T. Sutou, Y. Morikawa, H. Mohri, N. Hayashi

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12