Rigorous vectorial modeling for polarized illumination and projection pupil in OPC

Author(s):

• Q. Zhang ( Synopsys, Inc., USA )
• H. Song ( Synopsys, Inc., USA )
• K. Lucas ( Synopsys, Inc., USA )
• B. Ward ( Synopsys, Inc., Belgium )
• J. Shiely ( Synopsys, Inc., USA )

Publication title:

Photomask and next-generation lithography mask technology XV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

7028

Pub. Year:

2008

Vol.:

1

Page(from):

702813-1

Page(to):

702813-11

Pages:

11

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819472434 [0819472433]

Language:

English

Call no.:

P63600/7028

Type:

Conference Proceedings