A study of mask specification in spacer patterning technology
- Author(s):
- H. Mukai ( Toshiba Corp., Japan )
- Y. Kobayashi ( Toshiba Corp., Japan )
- S. Yamaguchi ( Toshiba Corp., Japan )
- K. Kawano ( Toshiba Corp., Japan )
- K. Hashimoto ( Toshiba Corp., Japan )
- Publication title:
- Photomask and next-generation lithography mask technology XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 7028
- Pub. Year:
- 2008
- Vol.:
- 1
- Page(from):
- 702812-1
- Page(to):
- 702812-8
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819472434 [0819472433]
- Language:
- English
- Call no.:
- P63600/7028
- Type:
- Conference Proceedings
Similar Items:
Society of Photo-optical Instrumentation Engineers |
7
Conference Proceedings
Fine pixel SEM image for mask pattern quality assurance based on lithography simulation [6283-48]
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
8
Conference Proceedings
A novel lithography design and verification methodology with patterning failure
Society of Photo-optical Instrumentation Engineers |
3
Conference Proceedings
Mask quality assurance in cleaning for haze elimination using flexible mask specifications
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Mask pattern quality assurance based on lithography simulation with fine pixel SEM image [5992-59]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |