Extension of the 2D-TCC technique to optimize mask pattern layouts
- Author(s):
- M. Hakko ( Canon Inc., Japan )
- K. Yamazoe ( Canon Inc., Japan )
- M. Kawashima ( Canon Inc., Japan )
- Y. Sekine ( Canon Inc., Japan )
- M. Ohta ( Canon Inc., Japan )
- Publication title:
- Photomask and next-generation lithography mask technology XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 7028
- Pub. Year:
- 2008
- Vol.:
- 1
- Page(from):
- 70280Z-1
- Page(to):
- 70280Z-11
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819472434 [0819472433]
- Language:
- English
- Call no.:
- P63600/7028
- Type:
- Conference Proceedings
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