Yield-centric layout optimization with precise quantification of lithographic yield loss
- Author(s):
- S. Kobayashi ( Toshiba Corp., Japan )
- S. Kyoh ( Toshiba Corp., Japan )
- K. Kinoshita ( Toshiba Corp., Japan )
- Y. Urakawa ( Toshiba Corp., Japan )
- E. Morifuji ( Toshiba Corp., Japan )
- Publication title:
- Photomask and next-generation lithography mask technology XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 7028
- Pub. Year:
- 2008
- Vol.:
- 1
- Page(from):
- 70280O-1
- Page(to):
- 70280O-8
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819472434 [0819472433]
- Language:
- English
- Call no.:
- P63600/7028
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
3
Conference Proceedings
Lithographic performance and optimization of chemically amplified single-layer resists for EUV lithograph
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Automated hot-spot fixing system applied for metal layers of 65 nm logic devices [6283-101]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
12
Conference Proceedings
Yield-enhanced layout generation by new design for manufacturability (DfM) flow
SPIE - The International Society of Optical Engineering |