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Model based short range mask process correction

Author(s):
  • G. Chen ( Brion Technologies, Inc., USA )
  • J. -S. Wang ( Brion Technologies, Inc., USA )
  • S. Bai ( Brion Technologies, Inc., USA )
  • R. Howell ( Brion Technologies, Inc., USA )
  • J. Wiley ( Brion Technologies, Inc., USA )
Publication title:
Photomask and next-generation lithography mask technology XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7028
Pub. Year:
2008
Vol.:
1
Page(from):
70280G-1
Page(to):
70280G-10
Pages:
10
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819472434 [0819472433]
Language:
English
Call no.:
P63600/7028
Type:
Conference Proceedings

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