Modeling of charging effect and its correction by EB mask writer EBM-6000

Author(s):

• N. Nakayamada ( NuFlare Technology, Inc., Japan )
• S. Wake ( NuFlare Technology, Inc., Japan )
• T. Kamikubo ( NuFlare Technology, Inc., Japan )
• H. Sunaoshi ( NuFlare Technology, Inc., Japan )
• S. Tamamushi ( NuFlare Technology, Inc., Japan )

Publication title:

Photomask and next-generation lithography mask technology XV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

7028

Pub. Year:

2008

Vol.:

1

Page(from):

70280C-1

Page(to):

70280C-12

Pages:

12

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819472434 [0819472433]

Language:

English

Call no.:

P63600/7028

Type:

Conference Proceedings