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Influence of substrate temperature on the morphology and thermal resistance of vanadium oxide thin films

Author(s):
  • X. Wei ( Univ. of Electronic Science and Technology of China, China )
  • Z. Wu ( Univ. of Electronic Science and Technology of China, China )
  • T. Wang ( Univ. of Electronic Science and Technology of China, China )
  • X. Xu ( Univ. of Electronic Science and Technology of China, China )
  • J. Tang ( Univ. of Electronic Science and Technology of China, China )
Publication title:
Sixth International Conference on Thin Film Physics and Applications : 25-28 September 2007, Shanghai, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6984
Pub. Year:
2008
Page(from):
69842K-1
Page(to):
69842K-4
Pages:
4
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471826 [0819471828]
Language:
English
Call no.:
P63600/6984
Type:
Conference Proceedings

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