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32 nm 1:1 line and space patterning by resist reflow process

Author(s):
  • J.-M. Park ( Hanyang Univ., South Korea )
  • H. Jeong ( Hanyang Univ., South Korea )
  • I. An ( Hanyang Univ., South Korea )
  • H.-K. Oh ( Hanyang Univ., South Korea )
Publication title:
Optical Microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6924
Pub. Year:
2008
Vol.:
3
Page(from):
69244S-1
Page(to):
69244S-9
Pages:
9
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471093 [0819471097]
Language:
English
Call no.:
P63600/6924
Type:
Conference Proceedings

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