Advanced mask process modeling for 45-nm and 32-nm nodes

Advanced mask process modeling for 45-nm and 32-nm nodes

Author(s):

E. Tejnil ( Mentor Graphics Corp., USA )
Y. Hu ( Mentor Graphics Corp., USA )
E. Sahouria ( Mentor Graphics Corp., USA )
S. Schulze ( Mentor Graphics Corp., USA )
M. J. Tian ( SMIC, China )

Publication title:

Optical Microlithography XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6924

Pub. Year:

2008

Vol.:

3

Page(from):

69243H-1

Page(to):

69243H-12

Pages:

12

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471093 [0819471097]

Language:

English

Call no.:

P63600/6924

Type:

Conference Proceedings

Details

TDL ID:	ZA00052555
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2008 : 21st
Conf. info. (Venue):	San Jose, California, USA
Conf. info. (Date):	2008.02.26-2008.02.29
Note for article:	Optical Microlithography XXI, 26-29 February 2008, San Jose, California, USA. Poster Session: OPC and Mask Technology, 69243H, 6924-125

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