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32 nm logic patterning options with immersion lithography

Author(s):
  • K. Lai ( IBM Computational Scaling and Advanced Lithography Research, USA )
  • S. Burns ( IBM Computational Scaling and Advanced Lithography Research, USA )
  • S. Halle ( IBM Computational Scaling and Advanced Lithography Research, USA )
  • L. Zhuang ( IBM Computational Scaling and Advanced Lithography Research, USA )
  • M. Colburn ( IBM Computational Scaling and Advanced Lithography Research, USA )
Publication title:
Optical Microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6924
Pub. Year:
2008
Vol.:
2
Page(from):
69243C-1
Page(to):
69243C-11
Pages:
11
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471093 [0819471097]
Language:
English
Call no.:
P63600/6924
Type:
Conference Proceedings

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