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Improvement of the common DoF across field for hole-structure process layers

Author(s):
  • S. H. Hou ( United Microelectronics Corp., Taiwan )
  • E. Huang ( United Microelectronics Corp., Taiwan )
  • A. Tseng ( United Microelectronics Corp., Taiwan )
  • M. Yeh ( United Microelectronics Corp., Taiwan )
  • B. Lin ( United Microelectronics Corp., Taiwan )
Publication title:
Optical Microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6924
Pub. Year:
2008
Vol.:
2
Page(from):
692434-1
Page(to):
692434-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471093 [0819471097]
Language:
English
Call no.:
P63600/6924
Type:
Conference Proceedings

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