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Novel lithography rule check for full-chip side lobe detection

Author(s):
  • T. S. Wu ( Macronix International Co., Ltd., Taiwan )
  • E. Yang ( Macronix International Co., Ltd., Taiwan )
  • T. H. Yang ( Macronix International Co., Ltd., Taiwan )
  • K. C. Chen ( Macronix International Co., Ltd., Taiwan )
  • C. Y. Lu ( Macronix International Co., Ltd., Taiwan )
Publication title:
Optical Microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6924
Pub. Year:
2008
Vol.:
2
Page(from):
692431-1
Page(to):
692431-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471093 [0819471097]
Language:
English
Call no.:
P63600/6924
Type:
Conference Proceedings

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