XLR 600i: recirculating ring ArF light source for double patterning immersion lithography

Author(s):

• V. Fleurov ( Cymer, Inc., USA )
• S. Rokitski ( Cymer, Inc., USA )
• R. Bergstedt ( Cymer, Inc., USA )
• H. Ye ( Cymer, Inc., USA )
• K. O'Brien ( Cymer, Inc., USA )

Publication title:

Optical Microlithography XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6924

Pub. Year:

2008

Vol.:

2

Page(from):

69241R-1

Page(to):

69241R-5

Pages:

5

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471093 [0819471097]

Language:

English

Call no.:

P63600/6924

Type:

Conference Proceedings