Analysis of OPC optical model accuracy with detailed scanner information

Author(s):

• L. Zavyalova ( Synopsys, Inc., USA )
• K. Lucas ( Synopsys, Inc., USA )
• Q. Zhang ( Synopsys, Inc., USA )
• Y. Fan ( Synopsys, Inc., USA )
• S. Sethi ( Synopsys, Inc., USA )

Publication title:

Optical Microlithography XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6924

Pub. Year:

2008

Vol.:

1

Page(from):

69241D-1

Page(to):

69241D-12

Pages:

12

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471093 [0819471097]

Language:

English

Call no.:

P63600/6924

Type:

Conference Proceedings