Immersion defectivity study with volume production immersion lithography tool for 45 nm node and below

Immersion defectivity study with volume production immersion lithography tool for 45 nm node and below

Author(s):

K. Nakano ( Nikon Corp., Japan )
S. Nagaoka ( Nikon Corp., Japan )
M. Yoshida ( Nikon Corp., Japan )
Y. Iriuchijima ( Nikon Corp., Japan )
T. Fujiwara ( Nikon Corp., Japan )

Publication title:

Optical Microlithography XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6924

Pub. Year:

2008

Vol.:

1

Page(from):

692418-1

Page(to):

692418-11

Pages:

11

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471093 [0819471097]

Language:

English

Call no.:

P63600/6924

Type:

Conference Proceedings

Details

TDL ID:	ZA00052555
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2008 : 21st
Conf. info. (Venue):	San Jose, California, USA
Conf. info. (Date):	2008.02.26-2008.02.29
Note for article:	Optical Microlithography XXI, 26-29 February 2008, San Jose, California, USA. Session 10. Process I, 692418, 6924-43

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