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Comparative study of binary intensity mask and attenuated phase shift mask using hyper-NA immersion lithography for sub-45nm era

Author(s):
  • T.-S. Eom ( Hynix Semiconductor, Inc., South Korea )
  • J.-T. Park ( Hynix Semiconductor, Inc., South Korea )
  • J.-H. Kang ( Hynix Semiconductor, Inc., South Korea )
  • S. Park ( Hynix Semiconductor, Inc., South Korea )
  • S. Koo ( Hynix Semiconductor, Inc., South Korea )
Publication title:
Optical Microlithography XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6924
Pub. Year:
2008
Vol.:
1
Page(from):
69240H-1
Page(to):
69240H-10
Pages:
10
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471093 [0819471097]
Language:
English
Call no.:
P63600/6924
Type:
Conference Proceedings

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