Toward 3nm overlay and critical dimension uniformity: an integrated error budget for double patterning lithography
- Author(s):
- W. H. Arnold ( ASML Technology Development Ctr., USA )
- Publication title:
- Optical Microlithography XXI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6924
- Pub. Year:
- 2008
- Vol.:
- 1
- Page(from):
- 692404-1
- Page(to):
- 692404-9
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819471093 [0819471097]
- Language:
- English
- Call no.:
- P63600/6924
- Type:
- Conference Proceedings
Similar Items:
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
3
Conference Proceedings
Development of materials and processes for double patterning toward 32-nm node 193-nm immersion lithography process
Society of Photo-optical Instrumentation Engineers |
9
Conference Proceedings
Analysis of critical dimension uniformity for Step and Flash imprint lithography
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
45nm and 32nm half-pitch patterning with 193nm dry lithography and double patterning
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Compact formulation of mask error factor for critical dimension control in optical lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Alignment system and process optimization for improvement of double patterning overlay
Society of Photo-optical Instrumentation Engineers |