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Study of shallow trench isolation dry etching process using oxide hard mask and KrF photo- resist in 90 nm stand-alone flash device

Author(s):
  • E. Cho ( Dongbu HiTek, South Korea )
  • M. Lee ( Dongbu HiTek, South Korea )
  • D. Shin ( Dongbu HiTek, South Korea )
  • S. Hwang ( Dongbu HiTek, South Korea )
  • S. Ryu ( Dongbu HiTek, South Korea )
Publication title:
Advances in resist materials and processing technology XXV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6923
Pub. Year:
2008
Vol.:
2
Page(from):
69233V-1
Page(to):
69233V-11
Pages:
11
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471086 [0819471089]
Language:
English
Call no.:
P63600/6923
Type:
Conference Proceedings

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