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Line width roughness (LWR) performance of novel surface conditioner solutions for immersion lithography

Author(s):
  • B. J. Lu ( United Microelectronics Corp., Taiwan , China )
  • E. T. Liu ( United Microelectronics Corp., Taiwan , China )
  • A. Zeng ( United Microelectronics Corp., Taiwan , China )
  • A. Tseng ( United Microelectronics Corp., Taiwan , China )
  • S. Wu ( United Microelectronics Corp., Taiwan , China )
Publication title:
Advances in resist materials and processing technology XXV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6923
Pub. Year:
2008
Vol.:
2
Page(from):
69233G-1
Page(to):
69233G-9
Pages:
9
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471086 [0819471089]
Language:
English
Call no.:
P63600/6923
Type:
Conference Proceedings

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