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Novel spin-on organic hardmask with high plasma etch resistance

Author(s):
  • C.-I. Oh ( Cheil Industries Inc., South Korea )
  • J.-K. Lee ( Cheil Industries Inc., South Korea )
  • M.-S. Kim ( Cheil Industries Inc., South Korea )
  • K.-H. Yoon ( Cheil Industries Inc., South Korea )
  • H.-S. Cheon ( Cheil Industries Inc., South Korea )
Publication title:
Advances in resist materials and processing technology XXV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6923
Pub. Year:
2008
Vol.:
2
Page(from):
69232V-1
Page(to):
69232V-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471086 [0819471089]
Language:
English
Call no.:
P63600/6923
Type:
Conference Proceedings

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