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Silicon-based anti-reflective spin-on hardmask materials for 45 nm pattern of immersion ArF lithography

Author(s):
  • S. K. Kim ( Samsung Cheil Industries Inc., South Korea )
  • H. M. Cho ( Samsung Cheil Industries Inc., South Korea )
  • S. R. Koh ( Samsung Cheil Industries Inc., South Korea )
  • M. Kim ( Samsung Cheil Industries Inc., South Korea )
  • H. C. Yoon ( Samsung Cheil Industries Inc., South Korea )
Publication title:
Advances in resist materials and processing technology XXV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6923
Pub. Year:
2008
Vol.:
2
Page(from):
69232Q-1
Page(to):
69232Q-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471086 [0819471089]
Language:
English
Call no.:
P63600/6923
Type:
Conference Proceedings

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