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High refractive-index resists composed of anionic photoacid generator (PAG) bound polymers for 193 nm immersion lithography

Author(s):
  • K. E. Gonsalves ( Univ. of North Carolina at Charlotte, USA )
  • M. Wang ( Univ. of North Carolina at Charlotte, USA )
  • N. S. Pujari ( Univ. of North Carolina at Charlotte, USA )
Publication title:
Advances in resist materials and processing technology XXV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6923
Pub. Year:
2008
Vol.:
1
Page(from):
69231P-1
Page(to):
69231P-7
Pages:
7
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471086 [0819471089]
Language:
English
Call no.:
P63600/6923
Type:
Conference Proceedings

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