The effect of EUV molecular gloss architecture on the bulk dispersion of a photo-acid generator

Author(s):

• D. L. VanderHart ( National Institute of Standards and Technology, USA )
• A. De Silva ( Cornell Univ., USA )
• N. Felix ( Cornell Univ., USA )
• V. M. Prabhu ( National Institute of Standards and Technology, USA )
• C. K. Ober ( Cornell Univ., USA )

Publication title:

Advances in resist materials and processing technology XXV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6923

Pub. Year:

2008

Vol.:

1

Page(from):

69231M-1

Page(to):

69231M-15

Pages:

15

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471086 [0819471089]

Language:

English

Call no.:

P63600/6923

Type:

Conference Proceedings