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Base quencher effects in chemically amplified resist at sub-30-nm fabrication

Author(s):
  • T. Kozawa ( Osaka Univ., Japan )
  • S. Tagawa ( Osaka Univ., Japan )
  • J. J. Santillan ( Semiconductor Leading Edge Technologies Inc., Japan )
  • M. Toriumi ( Semiconductor Leading Edge Technologies Inc., Japan )
  • T. Itani ( Semiconductor Leading Edge Technologies Inc., Japan )
Publication title:
Advances in resist materials and processing technology XXV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6923
Pub. Year:
2008
Vol.:
1
Page(from):
69230P-1
Page(to):
69230P-7
Pages:
7
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471086 [0819471089]
Language:
English
Call no.:
P63600/6923
Type:
Conference Proceedings

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