Resist freezing process for double exposure lithography

Resist freezing process for double exposure lithography

Author(s):

K.-J. R. Chen ( IBM Semiconductor Research and Development Ctr., USA )
W.-S. Huang ( IBM Semiconductor Research and Development Ctr., USA )
W.-K. Li ( IBM Semiconductor Research and Development Ctr., USA )
P. R. Varanasi ( IBM Semiconductor Research and Development Ctr., USA )

Publication title:

Advances in resist materials and processing technology XXV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6923

Pub. Year:

2008

Vol.:

1

Page(from):

69230G-1

Page(to):

69230G-10

Pages:

10

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471086 [0819471089]

Language:

English

Call no.:

P63600/6923

Type:

Conference Proceedings

Details

TDL ID:	ZA00052554
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in Resist Materials and Processing Technology
Conf. info. (Number):	2008 : 25th
Conf. info. (Venue):	San Jose, California, USA
Conf. info. (Date):	2008.02.25-2008.02.27
Note for article:	Advances in resist materials and processing technology XXV, 25-27 February 2008, San Jose, California, USA. Session 4. Materials and Processes for Double Patterning/Double Exposure, 69230G, 6923-16

Similar Items:

1 Conference Proceedings Rational design in cyclic olefin resists for sub-100-nm lithography Li, W., Varanasi, P.R., Lawson, M.C., Kwong, R.W., Chen, K.-J., Ito, H., Truong, H.D., Allen, R.D., Yamamoto, M., … SPIE-The International Society for Optical Engineering	7 Conference Proceedings New 193nm top antireflective coatings for superior swing reduction [6153-28] Huang, W.-S., Heath, W. H., Kwong, R., Li, W, Patel, K., Varanasi, P. R. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Impact of thin resist processes on post-etch LER Mahorowala, A.P., Goldfarb, D.L., Temple, K., Petrillo, K.E., Pfeiffer, D., Babich, K., Angelopoulos, M., Gallatin, … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Double exposure technology for KrF lithography S. Geisler, J. Bauer, U. Haak, D. Stolarek, K. Schulz Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Correlations between dissolution data and lithography of various resists DellaGuardia, R., Huang, W. -S., Chen, K. -J. R., Kang, D. SPIE - The International Society of Optical Engineering	9 Conference Proceedings OPC optimization for double dipole lithography and its application on 45nm node with dry exposure S.-J. Park, J.-K.Seo, C. Li, D. Liu, P. An Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings An analysis of double exposure lithography options S. Lee, J. Byers, K. Jen, P. Zimmerman, B. Rice Society of Photo-optical Instrumentation Engineers	10 Conference Proceedings Contact hole photo process improvement by multiple exposures with matched illumination settings Yen, Y.-S., Huang, I-H., Hwang, J.-R., Hung, K.-C., Ku, C.-F., Chang, C.-H., Fang, C.-Y., Yen, P.W. SPIE-The International Society for Optical Engineering
5 Conference Proceedings ArF resist for contact hole application Chen,K.-J.R., Lawaon,M.C., Hughes,T., Brunsvld,W.R., Varanasi,P.R., Keller,R., Jordhamo,G.M. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Extension of 193 nm dry lithography to 45-nm half-pitch node: double exposure and double processing technique [6349-62] Biswas, A. M., Li, J., Hiserote, J. A., Melvin III, L. S. SPIE - The International Society of Optical Engineering
6 Conference Proceedings BEOL lithography for early development at the 65-nm node DellaGuardia, R., Kwong, R.W., Li, W., Lawson, P., Burkhardt, M., Grauer, I.C., Wu, Q., Angyal, M., Hichri, H., … SPIE - The International Society of Optical Engineering	12 Conference Proceedings Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes) Varanasi,P.R., Jordhamo,G.M., Lawson,M.C., Chen,K.-J., Brunsvold,W.R., Hughes,T., Keller,R., Khojasteh,M., Li,W., … SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12