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High throughput wafer defect monitor for integrated metrology applications in photolithogrophy

Author(s):
  • N. Rao ( Real Time Metrology,INC., USA )
  • P. Kinney ( Real Time Metrology,INC., USA )
  • A. Gupta ( Real Time Metrology,INC., USA )
Publication title:
Metrology, inspection, and process control for microlithography XXII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6922
Pub. Year:
2008
Vol.:
2
Page(from):
69223B-1
Page(to):
69223B-12
Pages:
12
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471079 [0819471070]
Language:
English
Call no.:
P63600/6922
Type:
Conference Proceedings

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