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Accurate in-resolution level overlay metrology for multipatterning lithography techniques

Author(s):
  • I. Englard ( Applied Materials Europe, Netherlands )
  • R. Piech ( Applied Materials Europe, Netherlands )
  • C. Masia ( Applied Materials Europe, Netherlands )
  • N. Hillel ( Applied Materials, Israel )
  • L. Gershtein ( Applied Materials, Israel )
Publication title:
Metrology, inspection, and process control for microlithography XXII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6922
Pub. Year:
2008
Vol.:
1
Page(from):
69221D-1
Page(to):
69221D-9
Pages:
9
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471079 [0819471070]
Language:
English
Call no.:
P63600/6922
Type:
Conference Proceedings

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