Characterization of 32nm node BEOL grating structures using scatterometry

Characterization of 32nm node BEOL grating structures using scatterometry

Author(s):

S. Zangooie ( IBM Microelectronics, USA )
M. Sendelbach ( IBM Microelectronics, USA )
M. Angyal ( IBM Microelectronics, USA )
C. Archie ( IBM Microelectronics, USA )
A. Vaid ( Advanced Micro Devices ,INC., USA )

Publication title:

Metrology, inspection, and process control for microlithography XXII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6922

Pub. Year:

2008

Vol.:

1

Page(from):

69220S-1

Page(to):

69220S-10

Pages:

10

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471079 [0819471070]

Language:

English

Call no.:

P63600/6922

Type:

Conference Proceedings

Details

TDL ID:	ZA00052553
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2008 : 22nd
Conf. info. (Venue):	San Jose, California, USA
Conf. info. (Date):	2008.02.25-2008.02.28
Note for article:	Metrology, inspection, and process control for microlithography XXII, San Jose, California, USA, 25-28 February 2008 - Session 6. Scatterometry I (69220S/6922-26)

Similar Items:

1 Conference Proceedings Characterization of capacitive 3D deep trench mask open structures using scatterometry S. Zangooie, P. Herrera, A. Mesfin, C. Archie, M. Sendelbach SPIE - The International Society of Optical Engineering	7 Conference Proceedings Accelerating 32nm BEOL technology development by advanced wafer inspection methodology P. R. Jeng, C. L. Lin, S. Jang, M. S. Liang, W. Chen Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings Assessing scatterometry for measuring advanced spacer structures with embedded SiGe M. Sendelbach, S. Zangooie, A. Vaid, P. Herrera, J. Leng Society of Photo-optical Instrumentation Engineers	8 Conference Proceedings Inspectability of PSM masks for the 32nm node using STARlight2+ C. -T. Huang, Y. -F. Cheng, S. -M. Kuo, C. -H. Huang, S. Chakravarty Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Scatterometry as technology enabler for embedded SiGe process A. Vaid, R. Pal, M. Sendelbach, S. Zangooie, K. Lensing Society of Photo-optical Instrumentation Engineers	9 Conference Proceedings 32nm Node Highly Reliable Cu/Low-k Integration Technology with CuMn Alloy Seed Shaoning Yao, Vincent McGahay, Matthew S. Angyal, Andrew H. Simon, Tom C. Lee, Cathryn Christiansen, Baozhen Li, Fen … Materials Research Society
4 Conference Proceedings Correlating scatterometry to CD-SEM and electrical gate measurements at the 90-nm node using TMU analysis Sendelbach, M., Archie, C.N., Banke, B., Mayer, J., Nii, H., Herrera, P., Hankinson, M. SPIE - The International Society of Optical Engineering	10 Conference Proceedings 90-nm lithography process characterization using ODP scatterometry technology Ke, C.-M., Yu, S.-S., Wang, Y.-H., Chou, Y.-J., Chen, J.-H., Lee, B.-H., Chu, H.-Y., Lin, H.-T., Gau, T.-S., Lin, C.-H., … SPIE - The International Society of Optical Engineering
5 Conference Proceedings Scatterometry measurement precision and accuracy below 70 nm Sendelbach, M., Archie, C.N. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Enabling gate etch process development using scatterometry J. Koshy, M. Sendelbach, P. Herrera SPIE - The International Society of Optical Engineering
6 Conference Proceedings BEOL lithography for early development at the 65-nm node DellaGuardia, R., Kwong, R.W., Li, W., Lawson, P., Burkhardt, M., Grauer, I.C., Wu, Q., Angyal, M., Hichri, H., … SPIE - The International Society of Optical Engineering	12 Conference Proceedings Predicting electrical measurements by applying scatterometry to complex spacer structures M. Sendelbach, J. Ayala, P. Herrera SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12