Blank Cover Image

Dimension controlled CNT probe of AFM metrology tool for 45-nm node and beyond

Author(s):
  • S. Sekino ( Hitachi Kenki FineTech Co.,Ltd., Japan )
  • T. Morimoto ( Hitachi Kenki FineTech Co.,Ltd., Japan )
  • T. Kurenuma ( Hitachi Kenki FineTech Co.,Ltd., Japan )
  • M. Hiraoka ( Hitachi,Ltd., Japan )
  • H. Tanaka ( Hitachi Kyowa Engineering Co.,Ltd., Japan )
Publication title:
Metrology, inspection, and process control for microlithography XXII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6922
Pub. Year:
2008
Vol.:
1
Page(from):
69220L-1
Page(to):
69220L-12
Pages:
12
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471079 [0819471070]
Language:
English
Call no.:
P63600/6922
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings New inline AFM metrology tool suited for LSI manufacturing at the 45-nm node and beyond

M. Edamura, Y. Kunitomo, T. Morimoto, S. Sekino, T. Kurenuma, Y. Kembo, M. Watanabe, S. Baba, K. Hidaka

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Multi-layer resist system for 45-nm-node and beyond: Part II [6349-121]

Fujimura, Y., Morimoto, J., Manoshiro, A., Shimizu, M., Takamizawa, H., Hashimoto, M., Shiratori, H., Horii, K., Yokoya, …

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error control

Y. Kojima, M. Shirasaki, K. Chiba, T. Tanaka, Y. Inazuki, H. Yoshikawa, S. Okazaki, K. Iwase, K. Ishikawa, K. Ozawa

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Multi-layer resist system for 45-nm-node and beyond: part I [6349-18]

Hashimoto, M., Shiratori, H., Horii, K., Yokoya, Y., Ohkubo, Y., Takamizawa, H., Fujimura, Y., Morimoto, J., Manoshiro, …

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Challenges for the quality control of assist features for 45nm node technology and beyond

L. Wang, T. Lukanc, M. Takahashi, H.-E. Kim, K. Phan

Society of Photo-optical Instrumentation Engineers
9 Conference Proceedings A novel AFM method for sidewall measurement of high-aspect ratio patterns

M. Watanabe, S. Baba, T. Nakata, T. Morimoto, S. Sekino

Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Self-assembled porous silica/Cu damascene interconnects for 45nm node and beyond (invited Papre) [6002-23]

Kikkawa T., Yagi R., Chikaki S., Shimoyama M., Ono T., Fujii N., Kohmura K., Tanaka H., Nakayama T., Ishikawa A., Motsuo …

SPIE - The International Society of Optical Engineering
10 Conference Proceedings CDU minimization at the 45-nm node and beyond: optical, resist, and process contributions to CD control

S. Scheer, M. Carcasi, T. Shibata, T. Otsuka

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Analysis of precise CD control for 45nm node and beyond

Cheng, Y. F., Wu, T. H., Lin, C. L., Chang, S. Y., Lin, B.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings CD metrology for the 45-nm and 32-nm nodes

Rice, B.J., Cao, H.B., Chaudhuri, O., Grumski, M.G., Harteneck, B.D., Liddle, A., Olynick, D., Roberts, J.M.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Recent CD AFM probe developments for sub-45 nm technology nodes

H.-C. Liu, J. R. Osborne, G. A. Dahlen, J. Greschner, T. Bayer

Society of Photo-optical Instrumentation Engineers
12 Conference Proceedings Multi-layer resist system for 45-nm-node and beyond: Part III [6349-120]

Abe, Y., Morimoto, J., Yokoyama, T., Kominato, A., Ohkubo, Y.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12