Controlled deposition of NIST-traceable nanoparticles as additional size standards for photomask applications
- Author(s):
- J. Wang ( Univ. of Minnesota, USA )
- D. Y. H. Pui ( Univ. of Minnesota, USA )
- C. Qi ( Univ. of Minnesota, USA )
- S.-J. Yook ( Hanyang Univ., South Korea )
- H. Fissan ( Institute of Energy and Environmental Technology e.V., Germany )
- Publication title:
- Metrology, inspection, and process control for microlithography XXII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6922
- Pub. Year:
- 2008
- Vol.:
- 1
- Page(from):
- 69220G-1
- Page(to):
- 69220G-10
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819471079 [0819471070]
- Language:
- English
- Call no.:
- P63600/6922
- Type:
- Conference Proceedings
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