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Optical through-focus technique that differentiates small changes in line width, line height. and sidewall angle for CD, overlay, and defect metrology applications

Author(s):
  • R. Attota ( National Institute of Standards and Technology, USA )
  • R. Silver ( National Institute of Standards and Technology, USA )
  • B. M. Barnes ( KT Consulting,INC., USA )
Publication title:
Metrology, inspection, and process control for microlithography XXII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6922
Pub. Year:
2008
Vol.:
1
Page(from):
69220E-1
Page(to):
69220E-12
Pages:
12
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471079 [0819471070]
Language:
English
Call no.:
P63600/6922
Type:
Conference Proceedings

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