Plasma cleaning of nanoparticles from EUV mask materials by electrostatics
- Author(s):
- W. M. Lytle ( Univ. of Illinois at Urbana- Champaign, USA )
- R. Raju ( Univ. of Illinois at Urbana- Champaign, USA )
- H. Shin ( Univ. of Illinois at Urbana- Champaign, USA )
- C. Das ( Univ. of Illinois at Urbana- Champaign, USA )
- M. J. Neumann ( Univ. of Illinois at Urbana- Champaign, USA )
- Publication title:
- Metrology, inspection, and process control for microlithography XXII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6922
- Pub. Year:
- 2008
- Vol.:
- 1
- Page(from):
- 69220D-1
- Page(to):
- 69220D-9
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819471079 [0819471070]
- Language:
- English
- Call no.:
- P63600/6922
- Type:
- Conference Proceedings
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SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
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Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |