Immersion lithography bevel solutions

Immersion lithography bevel solutions

Author(s):

L. Tedeschi ( SOKUDO Co. Ltd., Japan )
O. Tornado ( SOKUDO Co. Ltd., Japan )
M. Sonoda ( SOKUDO Co. Ltd., Japan )
S. Yasuda ( SOKUDO Co. Ltd., Japan )
M. Asai ( SOKUDO Co. Ltd., Japan )

Publication title:

Metrology, inspection, and process control for microlithography XXII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6922

Pub. Year:

2008

Vol.:

1

Page(from):

692206-1

Page(to):

692206-8

Pages:

8

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471079 [0819471070]

Language:

English

Call no.:

P63600/6922

Type:

Conference Proceedings

Details

TDL ID:	ZA00052553
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2008 : 22nd
Conf. info. (Venue):	San Jose, California, USA
Conf. info. (Date):	2008.02.25-2008.02.28
Note for article:	Metrology, inspection, and process control for microlithography XXII, San Jose, California, USA, 25-28 February 2008 - Session 2. Solutions for Today (692206/6922-158)

Similar Items:

1 Conference Proceedings Film stacking architecture for immersion lithography process T. Goto, M. Sonoda, T. Miyagi, K. Shigemori, M. Kanaoka Society of Photo-optical Instrumentation Engineers	7 Conference Proceedings Liquid immersion lithography: evaluation of resist issues Hinsberg, W., Wallraff, G.M., Larson, C.E., Davis, B.W., Deline, V., Raoux, S., Miller, D., Houle, F.A., Hoffnagle, J., … SPIE - The International Society of Optical Engineering
2 Conference Proceedings Improvements of adhesion and hydrophobicity of wafer bevel in water immersion lithography T. Ishibash, M. Terai, T. Hagiwara, T. Kumada, T. Hanawa Society of Photo-optical Instrumentation Engineers	8 Conference Proceedings Liquid immersion lithography at 157 nm Chen, C.-K., Gau, T.-S., Shiu, L.-H., Lin, B. J. SPIE - The International Society of Optical Engineering
3 Conference Proceedings 32 nm logic patterning options with immersion lithography K. Lai, S. Burns, S. Halle, L. Zhuang, M. Colburn Society of Photo-optical Instrumentation Engineers	9 Conference Proceedings Preliminary microfluidic simulations for immersion lithography Wei, A.C., Nellis, G.F., Abdo, A.Y., Engelstad, R.L., Chen, C.-F., Switkes, M., Rothschild, M. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Customized illumination shapes for 193nm immersion lithography M. L. Ling, G. S. Chua, Q. Lin, C. J. Tay, C. Quan Society of Photo-optical Instrumentation Engineers	10 Conference Proceedings Deep-UV immersion interferometric lithography Raub, A.K., Frauenglass, A., Brueck, S.R.J., Conley, W., Dammel, R.R., Romano, A., Sato, M., Hinsberg, W. SPIE - The International Society of Optical Engineering
5 Conference Proceedings First microprocessors with immersion lithography Lee, D.-Y., Kim, I.-S., Jung, S.-G., Jung, M.-H., Park, J.-O., Oh, S.-H., Woo, S.-G., Cho, H.-K., Moon, J.-T. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Simulation of the coupled thermal optical effects for liquid immersion micro-/nano-lithography Baek, S.-Y., Wei, A.C., Cole, D.C., Nellis, G., Yeung, M.S., Abdo, A.Y., Engelstad, R.L. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Scattering in liquid immersion lithography Switkes, M., Bloomstein, T.M., Kunz, R.R., Rothschild, M., Ruberti, J.W., Shedd, T.A., Yeung, M.S. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Depth-of-focus (DOF) and line-width roughness (LWR) performance of novel surface conditioner solutions for immersion lithography B. J. Lu, Y. Huang, H. T. Tseng, C. C. Yu, L. Meng, M. Liao, M. Legenza SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12