Phenomenological analysis of carbon deposition rate on the multilayer mirror

Phenomenological analysis of carbon deposition rate on the multilayer mirror

Author(s):

T. Nakayama ( EUVA, Japan )
H. Takase ( EUVA, Japan )
S. Terashima ( EUVA, Japan )
T. Sudo ( EUVA, Japan )
Y. Watanabe ( EUVA, Japan )

Publication title:

Emerging lithographic technologies XII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6921

Pub. Year:

2008

Vol.:

2

Page(from):

69213B-1

Page(to):

69213B-9

Pages:

9

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471062 [0819471062]

Language:

English

Call no.:

P63600/6921

Type:

Conference Proceedings

Details

TDL ID:	ZA00052552
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2008 : 12th
Conf. info. (Venue):	San Jose, California, USA
Conf. info. (Date):	2008.02.26-2008.02.28
Note for article:	Emerging lithographic technologies XII, San Jose, California, USA, 26-28 February 2008 - Poster Session: EUV Contamination (69213B/6921-124)

Similar Items:

1 Conference Proceedings Carbon deposition on multi-layer mirrors by extreme ultra violet ray irradiation S. Matsunari, T. Aoki, K. Murakami, Y. Gomei, S. Terashima, H. Takase, M. Tanabe, Y. Watanabe, Y. Kakutani, M. Niibe, Y. … SPIE - The International Society of Optical Engineering	7 Conference Proceedings Preliminary study on systematic optimization of EPL mask infrastructure Takase, H., Gomei, Y., Terashima, S., Kondo, H., Aoki, T., Matsunari, S., Niibe, M., Kakutani, Y. SPIE - The International Society of Optical Engineering
2 Conference Proceedings Study of ruthenium-capped multilayer mirror for EUV irradiation durability [6151-109] Takase, H, Terashima, S, Gomei, Y, Tanabe, M, Watanabe, Y, Aoki, T, Murakami, K, Matsunari, S, Niibe, M, Kakutani, Y SPIE - The International Society of Optical Engineering	8 Conference Proceedings EPL performance in 65-nm node metallization technology and beyond Kakutani, Y., Niibe, M., Takase, H., Terashima, S., Kondo, H., Matsunari, S., Aoki, T., Gomei, Y., Fukuda, Y. SPIE - The International Society of Optical Engineering
3 Conference Proceedings New contamination experimental equipment in the NewSUBARU and evaluation of SIcapped multilayer mirrors using it [6151-108] Niibe, M, Kakutani, Y, Terashima, S, Takase, H, Gomei, Y, Matsunari, S, Aoki, T, Murakami, K, Filida. Y SPIE - The International Society of Optical Engineering	9 Conference Proceedings Debris characterization and mitigation from microscopic laser-plasma tin-doped droplet EUV sources Aoki, T., Kondo, H., Matsunari, S., Takase, H., Gomei, Y., Terashima, S. SPIE - The International Society of Optical Engineering
4 Conference Proceedings A reflectance measurement system for investigating radiation damage to EUVL mirrors in NewSUBARU Kakutani, Y., Niibe, M., Kakiuchi, K., Takase, H., Terashima, S., Kondo, H., Matsunari, S., Aoki, T., Gomei, Y., Fukuda, … SPIE - The International Society of Optical Engineering	10 Conference Proceedings Long-term durability of a Ru capping layer for EUVL projection optics by introducing ethanol Y. Kakutani, M. Niibe, Y. Gomei, H. Takase, S. Terashima, S. Matsunari, T. Aoki, Y. Fukuda SPIE - The International Society of Optical Engineering
5 Conference Proceedings Adaptive x-ray optics with a deformable mirror [5900-44] Kitamoto, S., Yamamoto, N., Kohmura, T., Suga, K., Sekiguchi, H., Sato, J., Sudo, K., Watanabe, T., Ohkubo, Y., … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Deposition of multilayer mirrors with arbitrary period thickness distributions Foltyn, T., Braun, S., Moss, M., Leson, A. SPIE - The International Society of Optical Engineering
6 Conference Proceedings High-repetition-rate ArF excimer laser for microlithography Wakabayashi,O., Enami,T., Ishii,K., Terashima,K., Itakura,Y., Watanabe,T., Ohta,T., Ohbu,A., Kubo,H., Tanaka,H., … SPIE-The International Society for Optical Engineering	12 Conference Proceedings HIGH RATE DEPOSITION OF HYDROGENATED AMORPHOUS SILICON FILMS BY ECR PLASMA CVD Ozaki, S., Akahori, T., Tani, T., Nakayama, S. Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12