Dependence of EUV mask printing performance on blank architecture

Dependence of EUV mask printing performance on blank architecture

Author(s):

R. Jonckheere ( IMEC vzw, Belgium )
Y. Hyun ( IMEC vzw, Belgium )
F. Iwamoto ( IMEC vzw, Belgium )
B. Baudemprez ( IMEC vzw, Belgium )
J. Hermans ( IMEC vzw, Belgium )

Publication title:

Emerging lithographic technologies XII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6921

Pub. Year:

2008

Vol.:

2

Page(from):

69211W-1

Page(to):

69211W-14

Pages:

14

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471062 [0819471062]

Language:

English

Call no.:

P63600/6921

Type:

Conference Proceedings

Details

TDL ID:	ZA00052552
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2008 : 12th
Conf. info. (Venue):	San Jose, California, USA
Conf. info. (Date):	2008.02.26-2008.02.28
Note for article:	Emerging lithographic technologies XII, San Jose, California, USA, 26-28 February 2008 - Session 14. EUV Mask, Invited paper (69211W/6921-62)

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