Magic: a European program to push the insertion of maskless lithography
- Author(s):
- L. Pain ( CEA-LETI, MINATEC, France )
- B. Icard ( CEA-LETI, MINATEC, France )
- S. Tedesco ( CEA-LETI, MINATEC, France )
- B. Kampherbeek ( MAPPER Lithography B. V., Netherlands )
- G. Gross ( IMS Nanofabrication AG, Austria )
- Publication title:
- Emerging lithographic technologies XII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6921
- Pub. Year:
- 2008
- Vol.:
- 1
- Page(from):
- 69211S-1
- Page(to):
- 69211S-12
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819471062 [0819471062]
- Language:
- English
- Call no.:
- P63600/6921
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Electron beam lithography simulation based on a single convolution approach: application for sub-45nm nodes
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
8
Conference Proceedings
Negative-tone CAR resists for e-beam lithography: modification of chemical composition for R&D application ( high resolution ) or production application ( high …
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Bake condition effect on hybrid lithography process for negative-tone chemically amplified resists
SPIE - The International Society for Optical Engineering |
9
Conference Proceedings
Large-field ion optics for projection and proximity printing and for maskless lithography (MLZ)
SPIE-The International Society for Optical Engineering |
American Society of Mechanical Engineers |
10
Conference Proceedings
Projection maskless lithography (PML2): proof-of-concept setup and first experimental results
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Resist composition effects on ultimate resolution of negative-tone chemically amplified resists
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |