Blank Cover Image

Patterning fidelity on low-energy multiple-electron-beam direct write lithography

Author(s):
  • S. M. Chang ( Taiwan Semiconductor Manufacturing Co., Taiwan )
  • S. J. Lin ( Taiwan Semiconductor Manufacturing Co., Taiwan )
  • C. A. Lin ( Taiwan Semiconductor Manufacturing Co., Taiwan )
  • J. H. Chen ( Taiwan Semiconductor Manufacturing Co., Taiwan )
  • T. S. Gau ( Taiwan Semiconductor Manufacturing Co., Taiwan )
Publication title:
Emerging lithographic technologies XII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6921
Pub. Year:
2008
Vol.:
1
Page(from):
69211R-1
Page(to):
69211R-9
Pages:
9
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471062 [0819471062]
Language:
English
Call no.:
P63600/6921
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Application of direct-write electron-beam lithography for deep-submicron fabrication

Shy,S.L., Yew,J.Y., Nakamura,K., Chang,C.Y.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Evaluation of fine pattern definition with electron-beam direct writing lithography

Chiou,T.-B., Hahmann,P., Liaw,M.-C., Huang,T.-Y., Sze,S.M.

SPIE - The International Society for Optical Engineering
2 Conference Proceedings Immersion defect reduction, part II: the formation mechanism and reduction of patterned defects

L. Shiu, F. Liang, H. Chang, C. Chen, L. Chen, T. Gau, B. J. Lin

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Influence of shot noise on CDU with DUV, EUV, and E-beam

Z.-Y. Pan, C.-K. Chen, T.-S. Gau, B. J. Lin

Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Liquid immersion lithography at 157 nm

Chen, C.-K., Gau, T.-S., Shiu, L.-H., Lin, B. J.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Mask pattern fidelity quantification

Wang, W.-C., Chang, S.-M., Chin, C.C., Lu, C.-L., Chin, A.S.J., Hsieh, H.-C., Yu, S.-S.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Pattern fidelity enhancement with OPC pattern generation on laser lithography [6283-12]

Lee, G., Chung, -S. Y., Yang, -T.W., Cheng, -H. W., Lin, -J. R., Wang, S. T., Cheng, -C. Y., Chou, -J. W.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Effect of novel rinsing material and surfactant treatment on the resist pattern performance

V. Huang, C. C. Chiu, C. A. Lin, C. Y. Chang, T. S. Gau, B. J. Lin

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Defect inspection of positive and negative sub-60nm resist pattern printed with variable shaped E-Beam direct write lithography

C. Arndt, C. Hohle, J. Kretz, T. Lutz, M. Richter, K. Keil, M. Lapidot, D. Zemach, M. Kindler

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Nano patterning fabrication by low energy microcolumn lithography

T. Yoshimoto, S. H. Hwang, K. H. Kim, D. J. Seong, D. W. Kim, Y. C. Kim, S. J. Ahn, H. S. Kim

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Quantification of CD-SEM wafer global charging effect on CD and CD uniformity of 193-nm lithography

Ke, C.-M., Hung, H.-L., Chang, A., Chen, J.-H., Gau, T.-S., Ku, Y.-C., Lin, B.J., Otaka, T., Ueda, K., Kawada, H., …

SPIE - The International Society of Optical Engineering
12 Conference Proceedings SESSION 4 DIRECT WRITE

Poon, D. K., Chapman, G. H., Chang, C. Choo. M., Wang, J.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12