Extreme ultraviolet resist outgassing and its effect on nearby optics

Extreme ultraviolet resist outgassing and its effect on nearby optics

Author(s):

G. Denbeaux ( Univ. at Albany, USA )
R. Garg ( Univ. at Albany, USA )
C. Mbanaso ( Univ. at Albany, USA )
J. Waterman ( Univ. at Albany, USA )
L. Yankulin ( Univ. at Albany, USA )

Publication title:

Emerging lithographic technologies XII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6921

Pub. Year:

2008

Vol.:

1

Page(from):

69211G-1

Page(to):

69211G-7

Pages:

7

Pub. info.:

Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819471062 [0819471062]

Language:

English

Call no.:

P63600/6921

Type:

Conference Proceedings

Details

TDL ID:	ZA00052552
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging Lithographic Technologies
Conf. info. (Number):	2008 : 12th
Conf. info. (Venue):	San Jose, California, USA
Conf. info. (Date):	2008.02.26-2008.02.28
Note for article:	Emerging lithographic technologies XII, San Jose, California, USA, 26-28 February 2008 - Session 10. EUV Resists: Joint Session with Conference 6923 (69211G/6921-57)

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