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Fabrication of 200 nm period x-ray transmission gratings using electron beam lithography

Author(s):
  • X. Zhu ( Institute of Microelectronics, China )
  • C. Xie ( Institute of Microelectronics, China )
  • T. Ye ( Institute of Microelectronics, China )
  • M. Zhao ( Institute of Microelectronics, China )
  • J. Ma ( Institute of Microelectronics, China )
Publication title:
Holography and diffractive optics III : 12-14 November 2007, Beijing, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6832
Pub. Year:
2008
Page(from):
68320V-1
Page(to):
68320V-6
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819470072 [0819470074]
Language:
English
Call no.:
P63600/6832
Type:
Conference Proceedings

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