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The surface treatment of silicon wafer by microwave down-stream plasma etching

Author(s):
  • H. Ju ( Nagoya Univ., Japan )
  • W. Wang ( The Hong Kong Polytechnic Univ., Hong Kong China )
Publication title:
Nanophotonics, nanostructure, and nanometrology II : 12-14 November 2007, Beijing, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6831
Pub. Year:
2008
Page(from):
683114-1
Page(to):
683114-6
Pages:
6
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819470065 [0819470066]
Language:
English
Call no.:
P63600/6831
Type:
Conference Proceedings

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