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Measurements of silicon dry-etching rates and profiles in MEMS foundries and their application to MEMS design software

Author(s):
  • T. Takano ( National Institute of Advanced Industrial Science and Technology, Japan )
  • T. Ikehara ( National Institute of Advanced Industrial Science and Technology, Japan )
  • R. Maeda ( National Institute of Advanced Industrial Science and Technology, Japan )
Publication title:
Device and process technologies for microelectronics, MEMS, photonics, and nanotechnology IV : 5-7 December 2007, Canberra, Australia
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6800
Pub. Year:
2008
Page(from):
68001X-1
Page(to):
68001X-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819469717 [0819469718]
Language:
English
Call no.:
P63600/6800
Type:
Conference Proceedings

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