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New results from DUV water immersion microscopy using the CD metrology system LWM500 WI with a high NA condenser

Author(s):
Publication title:
EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6792
Pub. Year:
2008
Page(from):
679215-1
Page(to):
679215-6
Pages:
6
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819469564 [0819469564]
Language:
English
Call no.:
P63600/6792
Type:
Conference Proceedings

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