Optical proximity correction for 0.13 µm SiGe:C BiCMOS
- Author(s):
- S. Geisler ( Technische Fachhochschule Wildau, Germany )
- J. Bauer ( IHP Microelectronics, Germany )
- U. Haak ( IHP Microelectronics, Germany )
- U. Jagdhold ( IHP Microelectronics, Germany )
- R. Pliquett ( IHP Microelectronics, Germany )
- Publication title:
- EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6792
- Pub. Year:
- 2008
- Page(from):
- 679210-1
- Page(to):
- 679210-6
- Pages:
- 6
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819469564 [0819469564]
- Language:
- English
- Call no.:
- P63600/6792
- Type:
- Conference Proceedings
Similar Items:
ESA Communications |
Society of Photo-optical Instrumentation Engineers |
ESA Communications |
Society of Photo-optical Instrumentation Engineers |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
ESA Publications Division |
SPIE - The International Society for Optical Engineering |
Electrochemical Society |
Electrochemical Society |